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      Oxidation mechanisms in WSi2thin films

      Author(s): , , ,
      Publication date Created:
      Publication date (Print):
      Journal: Applied Physics Letters
      Publisher: AIP Publishing

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          Reaction kinetics of tungsten thin films on silicon (100) surfaces

          C. D. CAPIO, L. D. Locker (1973)
          Article 0 comments Cited 35 times – based on 0 reviews     Review now
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            High-Temperature Oxidation

            R. R. Dils, Joan Berkowitz‐Mattuck (1965)
            Article 0 comments Cited 11 times – based on 0 reviews     Review now
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              Fabrication and Thermal Stability of W-Si Ohmic Contacts

              V. Kumar (1976)
              Article 0 comments Cited 7 times – based on 0 reviews     Review now
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                Author and article information

                Journal
                Title: Applied Physics Letters
                Abbreviated Title: Appl. Phys. Lett.
                Publisher: AIP Publishing
                ISSN (Print): 0003-6951
                ISSN (Electronic): 1077-3118
                Publication date Created: July 1978
                Publication date (Print): July 1978
                Volume: 33
                Issue: 1
                Pages: 76-78
                Article
                DOI: 10.1063/1.90151
                SO-VID: cffbd707-7f2f-4ba4-ae88-4b376ba584b3
                Copyright © © 1978
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