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919
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Thermodynamic considerations in refractory metal‐silicon‐oxygen systems
Author(s):
Robert Beyers
Publication date
Created:
July 1984
Publication date
(Print):
July 1984
Journal:
Journal of Applied Physics
Publisher:
AIP Publishing
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Most cited references
21
Record
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Refractory silicides for integrated circuits
S. P. Murarka
(1980)
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Reaction of thin metal films with SiO2 substrates
R Pretorius
,
J.M. Harris
,
M‐A. Nicolet
(1978)
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Oxidation mechanisms in WSi2thin films
S. Zirinsky
,
F. d’Heurle
,
J. Baglin
…
(1978)
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Author and article information
Journal
Title:
Journal of Applied Physics
Abbreviated Title:
Journal of Applied Physics
Publisher:
AIP Publishing
ISSN (Print):
0021-8979
ISSN (Electronic):
1089-7550
Publication date Created:
July 1984
Publication date (Print):
July 1984
Volume
: 56
Issue
: 1
Pages
: 147-152
Article
DOI:
10.1063/1.333738
SO-VID:
2e02eec5-7f93-4b82-b063-f120aadef876
Copyright ©
© 1984
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