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      Thermodynamic considerations in refractory metal‐silicon‐oxygen systems

      Journal of Applied Physics
      AIP Publishing

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          Refractory silicides for integrated circuits

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            Reaction of thin metal films with SiO2 substrates

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              Oxidation mechanisms in WSi2thin films

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                Author and article information

                Journal
                Journal of Applied Physics
                Journal of Applied Physics
                AIP Publishing
                0021-8979
                1089-7550
                July 1984
                July 1984
                : 56
                : 1
                : 147-152
                Article
                10.1063/1.333738
                2e02eec5-7f93-4b82-b063-f120aadef876
                © 1984
                History

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