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Evidence of aluminum silicate formation during chemical vapor deposition of amorphous Al2O3 thin films on Si(100)
T. M. Klein ,
D. Niu ,
W. S. Epling ,
W. Li ,
D. M. Maher ,
C. C. Hobbs ,
R. I. Hegde ,
I. J. R. Baumvol ,
G. N. Parsons
December 20 1999
December 20 1999
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Thermodynamic considerations in refractory metal‐silicon‐oxygen systems
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