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      The effect of ambipolar electric fields on the electron heating in capacitive RF plasmas

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      Plasma Sources Science and Technology
      IOP Publishing

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          Most cited references38

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          Principles of Plasma Discharges and Materials Processing

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            Particle-in-cell charged-particle simulations, plus Monte Carlo collisions with neutral atoms, PIC-MCC

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              Analytical solution for capacitive RF sheath

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                Author and article information

                Journal
                Plasma Sources Science and Technology
                Plasma Sources Sci. Technol.
                IOP Publishing
                0963-0252
                1361-6595
                February 01 2015
                December 09 2014
                : 24
                : 1
                : 015019
                Article
                10.1088/0963-0252/24/1/015019
                9c682dfc-3d6f-451d-bd9d-2351e7335906
                © 2014

                http://iopscience.iop.org/info/page/text-and-data-mining

                http://iopscience.iop.org/page/copyright

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