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      Analytical solution for capacitive RF sheath

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          On the Origin of the Cosmic Radiation

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            Regular and Stochastic Motion

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              Application of RF Discharges to Sputtering

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                Author and article information

                Journal
                IEEE Transactions on Plasma Science
                IEEE Trans. Plasma Sci.
                Institute of Electrical and Electronics Engineers (IEEE)
                00933813
                Dec. 1988
                : 16
                : 6
                : 638-644
                Article
                10.1109/27.16552
                0c2fb36a-be86-404d-ae07-c668c2bb67a1
                © 1988
                History

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