- Record: found
- Abstract: not found
- Conference Proceedings: not found
Low leakage and low variability Ultra-Thin Body and Buried Oxide (UT2B) SOI technology for 20nm low power CMOS and beyond
proceedings-article
F. Andrieu ,
O. Weber ,
J. Mazurier ,
O. Thomas ,
J-P. Noel ,
C. Fenouillet-Beranger ,
J-P. Mazellier ,
P. Perreau ,
T. Poiroux ,
Y. Morand ,
T. Morel ,
S. Allegret ,
V. Loup ,
S. Barnola ,
F. Martin ,
J-F. Damlencourt ,
I. Servin ,
M. Casse ,
X. Garros ,
O. Rozeau ,
M-A. Jaud ,
G. Cibrario ,
J. Cluzel ,
A. Toffoli ,
F. Allain ,
R. Kies ,
D. Lafond ,
V. Delaye ,
C. Tabone ,
L. Tosti ,
L. Brevard ,
P. Gaud ,
V. Paruchur ,
K.K. Bourdelle ,
W. Schwarzenbach ,
O. Bonnin ,
B-Y. Nguyen ,
B. Doris ,
F. Boeuf ,
T. Skotnicki ,
O. Faynot
June 2010
2010 IEEE Symposium on VLSI Technology
July 15, 2010 - July 17, 2010
Read this article at
ScienceOpenPublisher
There is no author summary for this article yet. Authors can add summaries to their articles on ScienceOpen to make them more accessible to a non-specialist audience.