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Issues in Metal Gate Electrode Selection for Bulk CMOS Devices
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Author(s):
V. Misra
Publication date
(Print):
2005
Publisher:
Springer Berlin Heidelberg
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MANAGEMENT - Journal of Contemporary Management Issues
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Band offsets of wide-band-gap oxides and implications for future electronic devices
John Robertson
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Thermodynamic considerations in refractory metal‐silicon‐oxygen systems
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Effects of high-/spl kappa/ gate dielectric materials on metal and silicon gate workfunctions
P. Ranade
,
Chenming Hu
,
Yee-Chia Yeo
…
(2002)
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Book Chapter
Publication date (Print):
2005
Pages
: 415-434
DOI:
10.1007/3-540-26462-0_14
SO-VID:
a3b51a6e-b967-4725-a15b-42908176a60c
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Book chapters
pp. 1
The Economic Implications of Moore's Law
pp. 33
Brief Notes on the History of Gate Dielectrics in MOS Devices
pp. 45
SiO2 Based MOSFETS: Film Growth and Si—SiO2 Interface Properties
pp. 91
Oxide Reliability Issues
pp. 123
Gate Dielectric Scaling to 2.0—1.0 nm: SiO2 and Silicon Oxynitride
pp. 143
Optimal Scaling Methodologies and Transistor Performance
pp. 195
Silicon Oxynitride Gate Dielectric for Reducing Gate Leakage and Boron Penetration Prior to High-k Gate Dielectric Implementation
pp. 223
Alternative Dielectrics for Silicon-Based Transistors: Selection Via Multiple Criteria
pp. 253
Materials Issues for High-k Gate Dielectric Selection and Integration
pp. 287
Designing Interface Composition and Structure in High Dielectric Constant Gate Stacks
pp. 311
Electronic Structure of Alternative High-k Dielectrics
pp. 359
Physicochemical Properties of Selected 4d, 5d, and Rare Earth Metals in Silicon
pp. 379
High-k Gate Dielectric Deposition Technologies
pp. 415
Issues in Metal Gate Electrode Selection for Bulk CMOS Devices
pp. 435
CMOS IC Fabrication Issues for High-k Gate Dielectric and Alternate Electrode Materials
pp. 483
Characterization and Metrology of Medium Dielectric Constant Gate Dielectric Films
pp. 521
Electrical Measurement Issues for Alternative Gate Stack Systems
pp. 567
High-k Gate Dielectric Materials Integrated Circuit Device Design Issues
pp. 607
High-k Crystalline Gate Dielectrics: A Research Perspective
pp. 639
High-k Crystalline Gate Dielectrics: An IC Manufacturer's Perspective
pp. 667
Advanced MOS-Devices
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