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      Issues in Metal Gate Electrode Selection for Bulk CMOS Devices

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      Springer Berlin Heidelberg

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          Band offsets of wide-band-gap oxides and implications for future electronic devices

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            Thermodynamic considerations in refractory metal‐silicon‐oxygen systems

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              Effects of high-/spl kappa/ gate dielectric materials on metal and silicon gate workfunctions

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                Book Chapter
                2005
                : 415-434
                10.1007/3-540-26462-0_14
                a3b51a6e-b967-4725-a15b-42908176a60c
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