Super-smooth indium–tin oxide thin films by negative sputter ion beam technology

Kim, D.; Paik, N W; Gupta, S.; Kim, S. J.; Sohn, M. H.

doi:10.1116/1.1577127

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Super-smooth indium–tin oxide thin films by negative sputter ion beam technology

Author(s): M. H. Sohn , D. Kim , S. J. Kim , N. W. Paik , S. Gupta

Publication date Created: July 2003

Publication date (Print): July 2003

Journal: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Publisher: American Vacuum Society

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Electrical, optical, and structural properties of indium–tin–oxide thin films for organic light-emitting devices

H. Kim, C. Gilmore, A. Piqué … (1999)

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Ultra‐low‐temperature growth of high‐integrity gate oxide films by low‐energy ion‐assisted oxidation

Y Kawai, T Ohmi, J. Watanabe … (1994)

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Use of the magnetron-sputtering technique for the control of the properties of indium tin oxide thin films

R.P Howson, S. Bhagwat (1999)

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Journal

Title: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Abbreviated Title: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Publisher: American Vacuum Society

ISSN (Print): 0734-2101

ISSN (Electronic): 1520-8559

Publication date Created: July 2003

Publication date (Print): July 2003

Volume: 21

Issue: 4

Pages: 1347-1350

Article

DOI: 10.1116/1.1577127

SO-VID: df0d22d4-7d1e-4abd-b9ce-447d42681300

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Super-smooth indium–tin oxide thin films by negative sputter ion beam technology

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Negative Pressure Wound Therapy

Most cited references 16

Electrical, optical, and structural properties of indium–tin–oxide thin films for organic light-emitting devices

Ultra‐low‐temperature growth of high‐integrity gate oxide films by low‐energy ion‐assisted oxidation

Use of the magnetron-sputtering technique for the control of the properties of indium tin oxide thin films

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