Effect of sputtering pressure and post-annealing on hydrophilicity of TiO2 thin films deposited by reactive magnetron sputtering

Liao, M.C.; Niu, H; Chen, G.S.

doi:10.1016/j.tsf.2010.04.106

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Effect of sputtering pressure and post-annealing on hydrophilicity of TiO2 thin films deposited by reactive magnetron sputtering

Author(s): M.C. Liao , H. Niu , G.S. Chen

Publication date Created: October 2010

Publication date (Print): October 2010

Journal: Thin Solid Films

Publisher: Elsevier BV

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Title: Thin Solid Films

Abbreviated Title: Thin Solid Films

Publisher: Elsevier BV

ISSN (Print): 00406090

Publication date Created: October 2010

Publication date (Print): October 2010

Volume: 518

Issue: 24

Pages: 7258-7262

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DOI: 10.1016/j.tsf.2010.04.106

SO-VID: 7f7894c4-a5c7-4265-b769-bcf512c0d727

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https://www.elsevier.com/tdm/userlicense/1.0/

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Effect of sputtering pressure and post-annealing on hydrophilicity of TiO2 thin films deposited by reactive magnetron sputtering

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