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      A review on recent advances in fabricating freestanding single-crystalline complex-oxide membranes and its applications

      , , ,
      Physica Scripta
      IOP Publishing

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          Abstract

          Complex-oxide materials are gaining a tremendous amount of interest in the semiconductor materials and device community as they hold many useful intrinsic physical properties such as ferro/piezoelectricity, pyroelectricity, ferromagnetism, as well as magnetostriction and other properties suitable for energy storage elements. Complex-oxides can also be complemented with conventional semiconductor-based devices or used by themselves to realize state-of-the-art electronic/photonic/quantum information devices. However, because complex-oxide materials have vastly different crystalline structures and lattice constant difference compared to conventional semiconductor devices (such as Si or III-V/III-N materials), integration of complex-oxides onto conventional semiconductor platforms has been difficult. Thus, there has been constant efforts to produce freestanding single-crystalline complex-oxide thin films such that these films can be transferred and integrated together with device platforms based on other materials. This review will provide a comprehensive review on single-crystalline complex-oxide membranes technology developed thus far: how they are synthesized, methods to release them from the substrate, and their outstanding properties and applications.

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              Graphene has been attracting great interest because of its distinctive band structure and physical properties. Today, graphene is limited to small sizes because it is produced mostly by exfoliating graphite. We grew large-area graphene films of the order of centimeters on copper substrates by chemical vapor deposition using methane. The films are predominantly single-layer graphene, with a small percentage (less than 5%) of the area having few layers, and are continuous across copper surface steps and grain boundaries. The low solubility of carbon in copper appears to help make this growth process self-limiting. We also developed graphene film transfer processes to arbitrary substrates, and dual-gated field-effect transistors fabricated on silicon/silicon dioxide substrates showed electron mobilities as high as 4050 square centimeters per volt per second at room temperature.
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                Author and article information

                Contributors
                Journal
                Physica Scripta
                Phys. Scr.
                IOP Publishing
                0031-8949
                1402-4896
                April 25 2023
                May 01 2023
                April 25 2023
                May 01 2023
                : 98
                : 5
                : 052002
                Article
                10.1088/1402-4896/acccb4
                d27b00c9-e0eb-46c6-8dbd-1f85f22aaaa3
                © 2023

                http://creativecommons.org/licenses/by/4.0/

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