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      Complementary Driving between 2D Heterostructures and Surface Functionalization for Surpassing Binary Logic Devices

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          Most cited references36

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          Transport Properties of a MoS2/WSe2 Heterojunction Transistor and Its Potential for Application.

          This paper studies band-to-band tunneling in the transverse and lateral directions of van der Waals MoS2/WSe2 heterojunctions. We observe room-temperature negative differential resistance (NDR) in a heterojunction diode comprised of few-layer WSe2 stacked on multilayer MoS2. The presence of NDR is attributed to the lateral band-to-band tunneling at the edge of the MoS2/WSe2 heterojunction. The backward tunneling diode shows an average conductance slope of 75 mV/dec with a high curvature coefficient of 62 V(-1). Associated with the tunnel-diode characteristics, a positive-to-negative transconductance in the MoS2/WSe2 heterojunction transistors is observed. The transition is induced by strong interlayer coupling between the films, which results in charge density and energy-band modulation. The sign change in transconductance is particularly useful for multivalued logic (MVL) circuits, and we therefore propose and demonstrate for the first time an MVL-inverter that shows three levels of logic using one pair of p-type transistors.
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            Multifunctional high-performance van der Waals heterostructures

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              Low-Resistance 2D/2D Ohmic Contacts: A Universal Approach to High-Performance WSe2, MoS2, and MoSe2 Transistors

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                Author and article information

                Contributors
                Journal
                ACS Applied Materials & Interfaces
                ACS Appl. Mater. Interfaces
                American Chemical Society (ACS)
                1944-8244
                1944-8252
                February 24 2021
                February 15 2021
                February 24 2021
                : 13
                : 7
                : 8692-8699
                Affiliations
                [1 ]SKKU Advanced Institute of Nanotechnology (SAINT), Sungkyunkwan University, Suwon 440-746, Korea
                [2 ]Department of Chemical Engineering, Yonsei University, Seoul 03722, Korea
                [3 ]Department of Nano Engineering, Sungkyunkwan University, Suwon 440-746, Korea
                Article
                10.1021/acsami.0c17739
                33586957
                c5907932-02c1-4541-b9c1-f825f5675ec2
                © 2021

                https://doi.org/10.15223/policy-029

                https://doi.org/10.15223/policy-037

                https://doi.org/10.15223/policy-045

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