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Scaling of 32nm low power SRAM with high-K metal gate
K.-H. Yang, R Wong, R. Hasumi, Y. GAO, N.S. Kim, D. LEE, S. Badrudduza, D NAIR, M. Ostermayr, H. KANG, H. Zhuang, J. Li, L. KANG, X Chen, A. Thean, F Arnaud, L Zhuang, C. Schiller, D. W. SUN, Y. Teh, J Wallner, Y. TAKASU, K. STEIN, S. Samavedam, D. Jaeger, C.V. Baiocco, M. Sherony, M. KHARE, C. LAGE, J. PAPE, J. Sudijono, A.L. Steegen, S Stiffler
2008
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