Improved remnant polarization of Zr-doped HfO 2 ferroelectric film by CF 4/O 2 plasma passivation

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Abstract

In this work, the impact of fluorine (CF ₄) and oxygen (O ₂) plasma passivation on HfZrO _x (HZO) based ferroelectric capacitor was investigated. By the fluorine passivation, the surface trap density and oxygen vacancies in the HZO-based Metal–ferroelectric–insulator–semiconductor (MFIS) capacitors were suppressed, resulting in the increased pristine remnant polarization (2P _r). The pristine value (2P _r) of baseline samples annealed at 500 °C and 600 °C were 11.4 µC/cm ² and 24.4 µC/cm ², respectively. However, with the F–passivation, the 2P _r values were increased to 30.8 µC/cm ² and 48.2 µC/cm ² for 500 °C and 600 °C, respectively. The amount of surface defects and oxygen vacancies are quantitatively confirmed by the conductance method and XPS analysis. However, due to the incorporation of fluorine atoms into the ferroelectric–insulator films, undesirable degradation on endurance characteristics were observed.

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Author and article information

Contributors

Changhwan Shin: cshin@korea.ac.kr

Journal

Journal ID (nlm-ta): Sci Rep

Journal ID (iso-abbrev): Sci Rep

Title: Scientific Reports

Publisher: Nature Publishing Group UK (London )

ISSN (Electronic): 2045-2322

Publication date (Electronic): 6 October 2022

Publication date PMC-release: 6 October 2022

Publication date Collection: 2022

Volume: 12

Electronic Location Identifier: 16750

Affiliations

[1 ]GRID grid.264381.a, ISNI 0000 0001 2181 989X, Department of Electrical and Computer Engineering, , Sungkyunkwan University, ; Suwon, 16419 South Korea

[2 ]GRID grid.214458.e, ISNI 0000000086837370, Department of Materials Science and Engineering, , University of Michigan, ; Ann Arbor, MI 48109 USA

[3 ]GRID grid.222754.4, ISNI 0000 0001 0840 2678, School of Electrical Engineering, , Korea University, ; Seoul, 02841 South Korea

Article

Publisher ID: 21263

DOI: 10.1038/s41598-022-21263-8

PMC ID: 9537174

PubMed ID: 36202954

SO-VID: 94544517-5571-443d-9f23-462a3b89ab1b

License:

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