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Material and electrical characterization of carbon-doped Ta[sub 2]O[sub 5] films for embedded dynamic random access memory applications
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Tantalum pentoxide (Ta2O5) thin films for advanced dielectric applications
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UV-O/sub 3/ and dry-O/sub 2/: Two-step-annealed chemical vapor-deposited Ta/sub 2/O/sub 5/ films for storage dielectrics of 64-Mb DRAMs
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