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      Molecular‐dynamics simulations of direct reactive ion etching of silicon by fluorine and chlorine

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      Journal of Applied Physics
      AIP Publishing

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          Computer simulation of local order in condensed phases of silicon

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            Surface science aspects of etching reactions

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              Theory of Auger Neutralization of Ions at the Surface of a Diamond-Type Semiconductor

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                Author and article information

                Journal
                Journal of Applied Physics
                Journal of Applied Physics
                AIP Publishing
                0021-8979
                1089-7550
                December 1995
                December 1995
                : 78
                : 11
                : 6604-6615
                Article
                10.1063/1.360482
                551fafea-177f-4151-9cdd-03a3fc4483ec
                © 1995
                History

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