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Molecular‐dynamics simulations of direct reactive ion etching of silicon by fluorine and chlorine
Author(s):
M. E. Barone
,
D. B. Graves
Publication date
Created:
December 1995
Publication date
(Print):
December 1995
Journal:
Journal of Applied Physics
Publisher:
AIP Publishing
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42
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Computer simulation of local order in condensed phases of silicon
Frank Stillinger
,
Thomas A. Weber
(1985)
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Surface science aspects of etching reactions
J.W. Coburn
,
Harold F. Winters
(1992)
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Theory of Auger Neutralization of Ions at the Surface of a Diamond-Type Semiconductor
Homer D. Hagstrum
(1961)
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Author and article information
Journal
Title:
Journal of Applied Physics
Abbreviated Title:
Journal of Applied Physics
Publisher:
AIP Publishing
ISSN (Print):
0021-8979
ISSN (Electronic):
1089-7550
Publication date Created:
December 1995
Publication date (Print):
December 1995
Volume
: 78
Issue
: 11
Pages
: 6604-6615
Article
DOI:
10.1063/1.360482
SO-VID:
551fafea-177f-4151-9cdd-03a3fc4483ec
Copyright ©
© 1995
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