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Comparative study of calixarene and HSQ resist systems for the fabrication of sub-20nm MOSFET device demonstrators
Author(s):
J. Kretz
,
L. Dreeskornfeld
,
G. Ilicali
,
T. Lutz
,
W. WEBER
,
W Weber
Publication date:
2005
Journal:
Microelectronic Engineering
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Digitizing Fabrication
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DOI::
10.1016/j.mee.2004.12.061
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