On-Wafer Spectrofluorometric Method for Determination of Relative Quantum Yields of Photoacid Generation in Chemically Amplified Resists

Feke, Gilbert D.; Grober, Robert D.; Pohlers, Gerd; Moore, Kathryn W; Cameron, James F.

doi:10.1021/ac0015319

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On-Wafer Spectrofluorometric Method for Determination of Relative Quantum Yields of Photoacid Generation in Chemically Amplified Resists

Author(s): Gilbert D. Feke , Robert D. Grober , Gerd Pohlers , Kathryn Moore , James F. Cameron

Publication date Created: July 2001

Publication date (Print): July 2001

Journal: Analytical Chemistry

Publisher: American Chemical Society (ACS)

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Title: Analytical Chemistry

Abbreviated Title: Anal. Chem.

Publisher: American Chemical Society (ACS)

ISSN (Print): 0003-2700

ISSN (Electronic): 1520-6882

Publication date Created: July 2001

Publication date (Print): July 2001

Volume: 73

Issue: 14

Pages: 3472-3480

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DOI: 10.1021/ac0015319

SO-VID: 1a955b68-c2b2-4a9d-850d-8d1506668e66

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On-Wafer Spectrofluorometric Method for Determination of Relative Quantum Yields of Photoacid Generation in Chemically Amplified Resists

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