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      Controlled Electron–Hole Trapping and Detrapping Process in GdAlO 3 by Valence Band Engineering

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          Semiconductor-based photocatalytic hydrogen generation.

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            A high-mobility electron gas at the LaAlO3/SrTiO3 heterointerface.

            Polarity discontinuities at the interfaces between different crystalline materials (heterointerfaces) can lead to nontrivial local atomic and electronic structure, owing to the presence of dangling bonds and incomplete atomic coordinations. These discontinuities often arise in naturally layered oxide structures, such as the superconducting copper oxides and ferroelectric titanates, as well as in artificial thin film oxide heterostructures such as manganite tunnel junctions. If polarity discontinuities can be atomically controlled, unusual charge states that are inaccessible in bulk materials could be realized. Here we have examined a model interface between two insulating perovskite oxides--LaAlO3 and SrTiO3--in which we control the termination layer at the interface on an atomic scale. In the simple ionic limit, this interface presents an extra half electron or hole per two-dimensional unit cell, depending on the structure of the interface. The hole-doped interface is found to be insulating, whereas the electron-doped interface is conducting, with extremely high carrier mobility exceeding 10,000 cm2 V(-1) s(-1). At low temperature, dramatic magnetoresistance oscillations periodic with the inverse magnetic field are observed, indicating quantum transport. These results present a broad opportunity to tailor low-dimensional charge states by atomically engineered oxide heteroepitaxy.
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              Dielectric functions and optical bandgaps of high-K dielectrics for metal-oxide-semiconductor field-effect transistors by far ultraviolet spectroscopic ellipsometry

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                Author and article information

                Journal
                The Journal of Physical Chemistry C
                J. Phys. Chem. C
                American Chemical Society (ACS)
                1932-7447
                1932-7455
                March 24 2016
                March 10 2016
                March 24 2016
                : 120
                : 11
                : 5916-5925
                Affiliations
                [1 ]Faculty of Applied Sciences, Department of Radiation Science and Technology (FAME-RST), Delft University of Technology, Mekelweg 15, 2629JB Delft, The Netherlands
                Article
                10.1021/acs.jpcc.6b00129
                f622b171-505f-4429-903f-c9e462fd3b38
                © 2016
                History

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