ScienceOpen:
research and publishing network
For Publishers
Discovery
Metadata
Peer review
Hosting
Publishing
For Researchers
Join
Publish
Review
Collect
My ScienceOpen
Sign in
Register
Dashboard
Blog
About
Search
Advanced search
My ScienceOpen
Sign in
Register
Dashboard
Search
Search
Advanced search
For Publishers
Discovery
Metadata
Peer review
Hosting
Publishing
For Researchers
Join
Publish
Review
Collect
Blog
About
1
views
0
references
Top references
cited by
4
0 reviews
Review
0
comments
Comment
0
recommends
+1
Recommend
0
collections
Add to
0
shares
Share
Twitter
Sina Weibo
Facebook
Email
5,323
similar
All similar
Record
: found
Abstract
: not found
Article
: not found
Evaluation of Pure Novolak Cresol-Formaldehyde Resins for Deep U.V. Lithography
Author(s):
E. Gipstein
Publication date:
1982
Journal:
Journal of The Electrochemical Society
Read this article at
ScienceOpen
Publisher
Further versions
open (via free pdf)
Powered by
Bookmark
There is no author summary for this article yet. Authors can add summaries to their articles on ScienceOpen to make them more accessible to a non-specialist audience.
Related collections
KOME: An International Journal of Pure Communication Inquiry
Author and article information
Journal
DOI::
10.1149/1.2123757
Data availability:
Comments
Comment on this article
Sign in to comment
scite_
Similar content
5,323
Preparation of ‘high-ortho’ novolak resins I. Metal ion catalysis and orientation effect
Authors:
D. Fraser
,
R. Hall
,
A. Raum
…
Molecular Weight-Intrinsic Viscosity Relationships for Phenol-Formaldehyde Novolak Resins
Authors:
F. L. Tobiason
,
Chris Chandler
,
F. Schwarz
Determination of the structural configuration of cresol–novolak resins by 13C NMR spectroscopy
Authors:
J. CAROTHERS
,
E. Gipstein
,
LAURA W. FLEMING
…
See all similar
Cited by
4
The Chemistry of Photoresists
Authors:
S. Richard Turner
,
Robert C Daly
High Technology and New Applications
Authors:
Andre Knop
,
Louis Pilato
Positive Photoresists
Authors:
Wayne M. Moreau
See all cited by