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      Trench filling by ionized metal physical vapor deposition

      Author(s): ,
      Publication date Created:
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      Journal: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
      Publisher: American Vacuum Society

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          Energy dependence of the ion-induced sputtering yields of monatomic solids

          Soji Miyagawa, Kenji Morita, Ryuichi Shimizu … (1984)
          Article 0 comments Cited 80 times – based on 0 reviews     Review now
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            Metal ion deposition from ionized mangetron sputtering discharge

            S Rossnagel (1994)
            Article 0 comments Cited 62 times – based on 0 reviews     Review now
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              Ionized physical vapor deposition of integrated circuit interconnects

              J. Hopwood (1998)
              Article 0 comments Cited 33 times – based on 0 reviews     Review now
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                Author and article information

                Journal
                Title: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
                Abbreviated Title: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
                Publisher: American Vacuum Society
                ISSN (Print): 0734-2101
                ISSN (Electronic): 1520-8559
                Publication date Created: September 2001
                Publication date (Print): September 2001
                Volume: 19
                Issue: 5
                Pages: 2652-2663
                Article
                DOI: 10.1116/1.1399318
                SO-VID: cd9b0b2f-6763-4ac1-bd65-2a4af19a8616
                Copyright © © 2001
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