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Ion‐ and electron‐assisted gas‐surface chemistry—An important effect in plasma etching
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Most cited references30
- Record: found
- Abstract: not found
- Article: not found
Positive‐ion bombardment of substrates in rf diode glow discharge sputtering
- Record: found
- Abstract: not found
- Article: not found
The etching of silicon with XeF2vapor
J Coburn, H. F. Winters (1979)
- Record: found
- Abstract: not found
- Article: not found
Electron‐beam fabrication of 80‐Å metal structures
N. Wittels, W. W. Molzen, J. Cuomo … (1976)