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      Improved chemical mechanical polishing performance in 4H-SiC substrate by combining novel mixed abrasive slurry and photocatalytic effect

      Author(s): , , , , ,
      Publication date Created:
      Publication date (Print):
      Journal: Applied Surface Science
      Publisher: Elsevier BV

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          ARXPS studies of SiO2-SiC interfaces and oxidation of 6H SiC single crystal Si-(001) and C-(001) surfaces

          J Halbritter, B. Hornetz, H-J. Michel (1994)
          Article 0 comments Cited 58 times – based on 0 reviews     Review now
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            Environment friendly chemical mechanical polishing of copper

            Zhenyu Zhang, Junfeng Cui, Jiabo Zhang … (2019)
            Article 0 comments Cited 32 times – based on 0 reviews     Review now
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              A novel approach of chemical mechanical polishing for a titanium alloy using an environment-friendly slurry

              Zhenyu Zhang, Zhifeng Shi, Yuefeng Du … (2018)
              Article 0 comments Cited 32 times – based on 0 reviews     Review now
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                Author and article information

                Journal
                Title: Applied Surface Science
                Abbreviated Title: Applied Surface Science
                Publisher: Elsevier BV
                ISSN (Print): 01694332
                Publication date Created: February 2022
                Publication date (Print): February 2022
                Volume: 575
                Page: 151676
                Article
                DOI: 10.1016/j.apsusc.2021.151676
                SO-VID: a43fb210-b9b6-4751-9a20-c7e8778987e7
                Copyright © © 2022
                License:

                https://www.elsevier.com/tdm/userlicense/1.0/

                https://doi.org/10.15223/policy-017

                https://doi.org/10.15223/policy-037

                https://doi.org/10.15223/policy-012

                https://doi.org/10.15223/policy-029

                https://doi.org/10.15223/policy-004

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