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      Structural and Optical Characterization of ZnS Ultrathin Films Prepared by Low-Temperature ALD from Diethylzinc and 1.5-Pentanedithiol after Various Annealing Treatments

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          Abstract

          The structural and optical evolution of the ZnS thin films prepared by atomic layer deposition (ALD) from the diethylzinc (DEZ) and 1,5-pentanedithiol (PDT) as zinc and sulfur precursors was studied. A deposited ZnS layer (of about 60 nm) is amorphous, with a significant S excess. After annealing, the stoichiometry improved for annealing temperatures ≥400 °C and annealing time ≥2 h, and 1:1 stoichiometry was obtained when annealed at 500 °C for 4 h. ZnS crystallized into small crystallites (1–7 nm) with cubic sphalerite structure, which remained stable under the applied annealing conditions. The size of the crystallites ( D) tended to decrease with annealing temperature, in agreement with the EDS data (decreased content of both S and Zn with annealing temperature); the D for samples annealed at 600 °C (for the time ≤2 h) was always the smallest. Both reflectivity and ellipsometric spectra showed characteristics typical for quantum confinement (distinct dips/peaks in UV spectral region). It can thus be concluded that the amorphous ZnS layer obtained at a relatively low temperature (150 °C) from organic S precursor transformed into the layers built of small ZnS nanocrystals of cubic structure after annealing at a temperature range of 300–600 °C under Ar atmosphere.

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          Most cited references62

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          A brief review of atomic layer deposition: from fundamentals to applications

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            Crystallinity of inorganic films grown by atomic layer deposition: Overview and general trends

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              Synthesis and Surface Engineering of Complex Nanostructures by Atomic Layer Deposition

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                Author and article information

                Journal
                Materials (Basel)
                Materials (Basel)
                materials
                Materials
                MDPI
                1996-1944
                30 September 2019
                October 2019
                : 12
                : 19
                : 3212
                Affiliations
                [1 ]Institute of Optoelectronics, Military University of Technology, Kaliskiego 2, 00-908 Warsaw, Poland; maksymilian.wlodarski@ 123456wat.edu.pl
                [2 ]Institute of Applied Physics, Military University of Technology, Kaliskiego 2, 00-908 Warsaw, Poland; urszula.chodorow@ 123456wat.edu.pl
                [3 ]Department of Advanced Materials and Technologies, Faculty of Advanced Technologies and Chemistry, Military University of Technology, Kaliskiego 2, 00-908 Warsaw, Poland; stanislaw.jozwiak@ 123456wat.edu.pl
                [4 ]VTT Technical Research Centre of Finland, Biologinkuja 5, Espoo, P.O. Box 1000, FI-02044 VTT, Espoo, Finland
                [5 ]Department of Physics, University of Jyväskylä, P.O. Box 35, FI-40014, Jyväskylä, Finland, timo.sajavaara@ 123456jyu.fi
                Author notes
                [* ]Correspondence: tomasz.durejko@ 123456wat.edu.pl (T.D.); malgorzata.norek@ 123456wat.edu.pl or mnorek73@ 123456gmail.com (M.N.); Tel.: +48-261-837-135 (T.D.); +48-261-839-350 (M.N.)
                [†]

                Current address: Department of Chemistry, University of Helsinki, P.O. Box 55, FI-00014 Helsinki, Finland.

                Author information
                https://orcid.org/0000-0003-1250-5797
                https://orcid.org/0000-0002-4166-2890
                Article
                materials-12-03212
                10.3390/ma12193212
                6804116
                31575000
                996ff6ee-20cc-45ae-92f5-2b36ed17dbc4
                © 2019 by the authors.

                Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license ( http://creativecommons.org/licenses/by/4.0/).

                History
                : 15 July 2019
                : 26 September 2019
                Categories
                Article

                atomic layer deposition (ald),zns thin films,annealing,optical properties

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