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      Characterisation of the PS-PMMA Interfaces in Microphase Separated Block Copolymer Thin Films by Analytical (S)TEM

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          Abstract

          Block copolymer (BCP) self-assembly is a promising tool for next generation lithography as microphase separated polymer domains in thin films can act as templates for surface nanopatterning with sub-20 nm features. The replicated patterns can, however, only be as precise as their templates. Thus, the investigation of the morphology of polymer domains is of great importance. Commonly used analytical techniques (neutron scattering, scanning force microscopy) either lack spatial information or nanoscale resolution. Using advanced analytical (scanning) transmission electron microscopy ((S)TEM), we provide real space information on polymer domain morphology and interfaces between polystyrene (PS) and polymethylmethacrylate (PMMA) in cylinder- and lamellae-forming BCPs at highest resolution. This allows us to correlate the internal structure of polymer domains with line edge roughnesses, interface widths and domain sizes. STEM is employed for high-resolution imaging, electron energy loss spectroscopy and energy filtered TEM (EFTEM) spectroscopic imaging for material identification and EFTEM thickness mapping for visualisation of material densities at defects. The volume fraction of non-phase separated polymer species can be analysed by EFTEM. These methods give new insights into the morphology of polymer domains the exact knowledge of which will allow to improve pattern quality for nanolithography.

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          Theory of Microphase Separation in Block Copolymers

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            Block copolymer thermodynamics: theory and experiment.

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              Directing the self-assembly of block copolymers

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                Author and article information

                Journal
                Nanomaterials (Basel)
                Nanomaterials (Basel)
                nanomaterials
                Nanomaterials
                MDPI
                2079-4991
                13 January 2020
                January 2020
                : 10
                : 1
                : 141
                Affiliations
                [1 ]‘Nanostructuring, Nanoanalysis and Photonic Materials’ Group, Department of Physics, Paderborn University, 33098 Paderborn, Germany lindner@ 123456physik.upb.de (J.K.N.L.)
                [2 ]Institute of Lightweight Design with Hybrid Materials (ILH), 33098 Paderborn, Germany
                [3 ]Center for Optoelectronics and Photonics Paderborn (CeOPP), 33098 Paderborn, Germany
                Author notes
                Author information
                https://orcid.org/0000-0001-9090-8677
                https://orcid.org/0000-0003-2367-9610
                https://orcid.org/0000-0002-4420-9389
                Article
                nanomaterials-10-00141
                10.3390/nano10010141
                7022429
                31941037
                8c07cb1f-6c21-4c73-8998-0a7103165680
                © 2020 by the authors.

                Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license ( http://creativecommons.org/licenses/by/4.0/).

                History
                : 18 December 2019
                : 09 January 2020
                Categories
                Article

                block copolymers,self-assembly,polymer interface,nanostructure metrology,line edge roughness ler,(s)tem,stem-eels of ps and pmma

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