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      Planarization of SiO2films using reactive ion beam in plasma enhanced chemical vapor deposition

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      Journal of Applied Physics
      AIP Publishing

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          Downstream microwave plasma‐enhanced chemical vapor deposition of oxide using tetraethoxysilane

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            Ionic Contamination and Transport of Mobile Ions in MOS Structures

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              Study of planarized sputter‐deposited SiO2

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                Author and article information

                Journal
                Journal of Applied Physics
                Journal of Applied Physics
                AIP Publishing
                0021-8979
                1089-7550
                May 1991
                May 1991
                : 69
                : 9
                : 6637-6642
                Article
                10.1063/1.348878
                890543cb-0e08-41ea-812d-d0552d1c8413
                © 1991
                History

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