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      Formation of Uniform Solid-Phase Epitaxial CoSi2Films by Patterning Method

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      Japanese Journal of Applied Physics
      Japan Society of Applied Physics

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          Journal
          JAPNDE
          Japanese Journal of Applied Physics
          Jpn. J. Appl. Phys.
          Japan Society of Applied Physics
          0021-4922
          1347-4065
          August 20 1985
          August 20 1985
          : 24
          : Part 1, No. 8
          : 912-917
          Article
          10.1143/JJAP.24.912
          87f15625-98fe-45d4-b981-1c327807e18b
          © 1985
          History

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