Group III Impurity Doped Zinc Oxide Thin Films Prepared by RF Magnetron Sputtering

Minami, Tadatsugu; Sato, Hirotoshi; Nanto, Hidehito; Takata, Shinzo

doi:10.1143/JJAP.24.L781

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Group III Impurity Doped Zinc Oxide Thin Films Prepared by RF Magnetron Sputtering

Author(s): Tadatsugu Minami , Hirotoshi Sato , Hidehito Nanto , Shinzo Takata

Publication date Created: October 20 1985

Publication date (Print): October 20 1985

Journal: Japanese Journal of Applied Physics

Publisher: Japan Society of Applied Physics

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Journal ID (publisher-id): JJAP

Title: Japanese Journal of Applied Physics

Abbreviated Title: Jpn. J. Appl. Phys.

Publisher: Japan Society of Applied Physics

ISSN (Print): 0021-4922

Publication date Created: October 20 1985

Publication date (Print): October 20 1985

Volume: 24

Issue: Part 2, No. 10

Pages: L781-L784

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DOI: 10.1143/JJAP.24.L781

SO-VID: 6f33225e-8a3e-4429-a767-56f52860d175

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Group III Impurity Doped Zinc Oxide Thin Films Prepared by RF Magnetron Sputtering

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