Internal stresses in titanium, nickel, molybdenum, and tantalum films deposited by cylindrical magnetron sputtering

Thornton, John A.; Hoffman, David W.

doi:10.1116/1.569113

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Internal stresses in titanium, nickel, molybdenum, and tantalum films deposited by cylindrical magnetron sputtering

Author(s): John A. Thornton , David W. Hoffman

Publication date Created: January 1977

Publication date (Print): January 1977

Journal: Journal of Vacuum Science and Technology

Publisher: American Vacuum Society

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Title: Journal of Vacuum Science and Technology

Abbreviated Title: Journal of Vacuum Science and Technology

Publisher: American Vacuum Society

ISSN (Print): 0022-5355

Publication date Created: January 1977

Publication date (Print): January 1977

Volume: 14

Issue: 1

Pages: 164-168

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DOI: 10.1116/1.569113

SO-VID: 6eb1d080-24ea-4aa8-b26b-c649bf2c1240

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Internal stresses in titanium, nickel, molybdenum, and tantalum films deposited by cylindrical magnetron sputtering

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