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      Synergistic effects of vacuum ultraviolet radiation, ion bombardment, and heating in 193nm photoresist roughening and degradation

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      Applied Physics Letters
      AIP Publishing

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          Industrial processing of polymers by low-pressure plasmas: the role of VUV radiation

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            Plasma-surface interactions of model polymers for advanced photoresists using C[sub 4]F[sub 8]∕Ar discharges and energetic ion beams

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              Modification of the micro- and nanotopography of several polymers by plasma treatments

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                Author and article information

                Journal
                Applied Physics Letters
                Appl. Phys. Lett.
                AIP Publishing
                0003-6951
                1077-3118
                April 14 2008
                April 14 2008
                : 92
                : 15
                : 153113
                Article
                10.1063/1.2912028
                6d77b9b2-a5b3-4e4e-8c55-59ecd25aca3c
                © 2008
                History

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