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Sub-10-nm high aspect ratio patterning of ZnO in a 500 μm main field
Author(s):
M. S. M. Saifullah
,
K SUBRAMANIAN
,
D. ANDERSON
,
Dae-Joon Kang
,
W Huck
,
G. Jones
,
Mark Welland
Publication date:
2006
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
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Silicon thin film solar cells
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DOI::
10.1116/1.2192545
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