Effet des paramètres de croissance sur les couches épitaxiales d'InP obtenues par MOCVD (metal-organic chemical vapor deposition) à basse pression

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Journal

Title: Canadian Journal of Physics

Abbreviated Title: Can. J. Phys.

Publisher: Canadian Science Publishing

ISSN (Print): 0008-4204

ISSN (Electronic): 1208-6045

Publication date Created: March 1991

Publication date (Print): March 1991

Volume: 69

Issue: 3-4

Pages: 412-421

Article

DOI: 10.1139/p91-067

SO-VID: 32fc26d3-8ca0-4feb-be12-ceeec7552248

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