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Silicon quantum wire array fabrication by electrochemical and chemical dissolution of wafers
Author(s):
L. T. Canham
Publication date
Created:
September 03 1990
Publication date
(Print):
September 03 1990
Journal:
Applied Physics Letters
Publisher:
AIP Publishing
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Digitizing Fabrication
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Unusually low surface-recombination velocity on silicon and germanium surfaces.
E Yablonovitch
,
D. L. Allara
,
C Chang
…
(1986)
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Electrolytic Shaping of Germanium and Silicon
A. Uhlir
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Infrared spectroscopy of Si(111) and Si(100) surfaces after HF treatment: Hydrogen termination and surface morphology
V. Burrows
,
Y. Chabal
,
G. S. Higashi
…
(1989)
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Author and article information
Journal
Title:
Applied Physics Letters
Abbreviated Title:
Appl. Phys. Lett.
Publisher:
AIP Publishing
ISSN (Print):
0003-6951
ISSN (Electronic):
1077-3118
Publication date Created:
September 03 1990
Publication date (Print):
September 03 1990
Volume
: 57
Issue
: 10
Pages
: 1046-1048
Article
DOI:
10.1063/1.103561
SO-VID:
1f7e98b6-1515-4f91-8a15-c35538f146ce
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© 1990
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