<title>High-throughput NGL electron-beam direct-write lithography system</title>

Parker, N. William; Brodie, Alan D.; McCoy, John H.; Dobisz, Elizabeth A.

doi:10.1117/12.390042

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<title>High-throughput NGL electron-beam direct-write lithography system</title>

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Author(s): N. William Parker , Alan D. Brodie , John H. McCoy

Editor(s): Elizabeth A. Dobisz

Publication date (Online): July 21 2000

Conference name: Microlithography 2000

Conference date: Sunday 27 February 2000

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Publication date (Online): July 21 2000

Publication date (Print): July 21 2000

Pages: 713-720

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DOI: 10.1117/12.390042

SO-VID: 058a5e3c-b6fc-4326-8cc3-7e21cee4ea69

Conference name: Microlithography 2000

Conference location: Santa Clara, CA

Conference date: Sunday 27 February 2000

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