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      Solution-based synthesis of wafer-scale epitaxial BiVO 4 thin films exhibiting high structural and optoelectronic quality†

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      , , , , , , ,
      Journal of Materials Chemistry. a
      The Royal Society of Chemistry

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          Abstract

          We demonstrate a facile approach to solution-based synthesis of wafer-scale epitaxial bismuth vanadate (BiVO 4) thin films by spin-coating on yttria-stabilized zirconia. Epitaxial growth proceeds via solid-state transformation of initially formed polycrystalline films, driven by interface energy minimization. The (010)-oriented BiVO 4 films are smooth and compact, possessing remarkably high structural quality across complete 2′′ wafers. Optical absorption is characterized by a sharp onset with a low sub-band gap response, confirming that the structural order of the films results in correspondingly high optoelectronic quality. This combination of structural and optoelectronic quality enables measurements that reveal a strong optical anisotropy of BiVO 4, which leads to significantly increased in-plane optical constants near the fundamental band edge that are of particular importance for maximizing light harvesting in semiconductor photoanodes. Temperature-dependent transport measurements confirm a thermally activated hopping barrier of ∼570 meV, consistent with small electron polaron conduction. This simple approach for synthesis of high-quality epitaxial BiVO 4, without the need for complex deposition equipment, enables a broadly accessible materials base to accelerate research aimed at understanding and optimizing photoelectrochemical energy conversion mechanisms.

          Abstract

          Epitaxial, (010)-oriented BiVO 4 films on 2′′ wafers synthesized by spin-coating and metalorganic decomposition exhibit remarkably high crystal quality. Spectroscopy reveals a large uniaxial optical anisotropy, confirming theoretical predictions.

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          Handbook of Optical Constants of Solids

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            Author and article information

            Journal
            J Mater Chem A Mater
            J Mater Chem A Mater
            TA
            JMCAET
            Journal of Materials Chemistry. a
            The Royal Society of Chemistry
            2050-7488
            2050-7496
            22 April 2022
            7 June 2022
            22 April 2022
            : 10
            : 22
            : 12026-12034
            Affiliations
            [a] Walter Schottky Institute and Physics Department, Technische Universität München Am Coulombwall 4 85748 Garching Germany sharp@ 123456wsi.tum.de
            Author information
            https://orcid.org/0000-0002-4225-0476
            https://orcid.org/0000-0001-8327-5760
            https://orcid.org/0000-0003-0419-4992
            https://orcid.org/0000-0003-2413-6079
            https://orcid.org/0000-0001-5238-7487
            Article
            d1ta10732a
            10.1039/d1ta10732a
            9172877
            d5006554-eb79-4ba8-9bcc-01d1c9434d75
            This journal is © The Royal Society of Chemistry
            History
            : 16 December 2021
            : 14 March 2022
            Page count
            Pages: 9
            Funding
            Funded by: Solar Technologies go Hybrid, doi 10.13039/100012027;
            Award ID: Unassigned
            Funded by: Horizon 2020 Framework Programme, doi 10.13039/100010661;
            Award ID: 841556
            Funded by: Deutsche Forschungsgemeinschaft, doi 10.13039/501100001659;
            Award ID: 428591260
            Award ID: EXC 2089/1 – 390776260
            Funded by: H2020 European Research Council, doi 10.13039/100010663;
            Award ID: 864234
            Funded by: Bayerische Akademie der Wissenschaften, doi 10.13039/501100007306;
            Award ID: Unassigned
            Categories
            Chemistry
            Custom metadata
            Paginated Article

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