1
views
0
recommends
+1 Recommend
0 collections
    0
    shares
      • Record: found
      • Abstract: found
      • Article: not found

      Low magnetic damping in an ultrathin CoFeB layer deposited on a 300 mm diameter wafer at cryogenic temperature

      , , , , , ,
      Applied Physics Express
      IOP Publishing

      Read this article at

      ScienceOpenPublisher
          There is no author summary for this article yet. Authors can add summaries to their articles on ScienceOpen to make them more accessible to a non-specialist audience.

          Abstract

          We deposited an ultrathin CoFeB(1.1 nm) layer, which functions as a storage layer of MgO-based magnetic tunnel junctions for spin-transfer-torque (STT) magnetoresistive random-access memory (MRAM), on ϕ300 mm wafers at 100 K and investigated its effect on the magnetization dynamics of CoFeB. We observed clear reductions in both the inhomogeneous linewidth and total magnetic damping parameter for the CoFeB layer deposited at 100 K compared to those deposited at 300 K through the improvement in the interfacial quality. The results show that deposition at cryogenic temperatures is an effective manufacturing process for high-quality magnetic thin films with low magnetic damping.

          Related collections

          Most cited references29

          • Record: found
          • Abstract: found
          • Article: not found

          A perpendicular-anisotropy CoFeB-MgO magnetic tunnel junction.

          Magnetic tunnel junctions (MTJs) with ferromagnetic electrodes possessing a perpendicular magnetic easy axis are of great interest as they have a potential for realizing next-generation high-density non-volatile memory and logic chips with high thermal stability and low critical current for current-induced magnetization switching. To attain perpendicular anisotropy, a number of material systems have been explored as electrodes, which include rare-earth/transition-metal alloys, L1(0)-ordered (Co, Fe)-Pt alloys and Co/(Pd, Pt) multilayers. However, none of them so far satisfy high thermal stability at reduced dimension, low-current current-induced magnetization switching and high tunnel magnetoresistance ratio all at the same time. Here, we use interfacial perpendicular anisotropy between the ferromagnetic electrodes and the tunnel barrier of the MTJ by employing the material combination of CoFeB-MgO, a system widely adopted to produce a giant tunnel magnetoresistance ratio in MTJs with in-plane anisotropy. This approach requires no material other than those used in conventional in-plane-anisotropy MTJs. The perpendicular MTJs consisting of Ta/CoFeB/MgO/CoFeB/Ta show a high tunnel magnetoresistance ratio, over 120%, high thermal stability at dimension as low as 40 nm diameter and a low switching current of 49 microA.
            Bookmark
            • Record: found
            • Abstract: found
            • Article: not found

            Enhanced gilbert damping in thin ferromagnetic films.

            The precession of the magnetization of a ferromagnet is shown to transfer spins into adjacent normal metal layers. This "pumping" of spins slows down the precession corresponding to an enhanced Gilbert damping constant in the Landau-Lifshitz equation. The damping is expressed in terms of the scattering matrix of the ferromagnetic layer, which is accessible to model and first-principles calculations. Our estimates for permalloy thin films explain the trends observed in recent experiments.
              Bookmark
              • Record: found
              • Abstract: not found
              • Article: not found

              230% room-temperature magnetoresistance in CoFeB∕MgO∕CoFeB magnetic tunnel junctions

                Bookmark

                Author and article information

                Contributors
                (View ORCID Profile)
                (View ORCID Profile)
                (View ORCID Profile)
                (View ORCID Profile)
                (View ORCID Profile)
                (View ORCID Profile)
                (View ORCID Profile)
                Journal
                Applied Physics Express
                Appl. Phys. Express
                IOP Publishing
                1882-0778
                1882-0786
                February 23 2023
                February 01 2023
                February 23 2023
                February 01 2023
                : 16
                : 2
                : 023003
                Article
                10.35848/1882-0786/acbae1
                8c03ef5b-b0a7-4c63-881a-2f8fd4f153a2
                © 2023

                https://iopscience.iop.org/page/copyright

                History

                Comments

                Comment on this article